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CC Series
The CC-200/400 is a compact and easy to use CVD system designed for R&D and Production environments.
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NE-5700
Dry etching system for high volume production with good cost performance and wide selection of tool configuration.
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RISE Series
Batch-Type chemical cleaning system used for the removal of native oxide in narrow and deep-contact patterns found in advanced semiconductor devices.
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ENVIRO-Optima
The ENVIRO-Optima resist strip system provides the highest throughput per m2 of clean-room space at the lowest cost.
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Qulee RGM2
Designed to meet the demands of diverse process monitoring applications, including etching, CVD, and other reactive gas processes. -
SME Series
The SME series deposition system is capable of handling up to 200mm substrate size and is available in several configurations from single to six process chambers.
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CS-200
The CS-200 is a compact load-lock type sputtering system. suitable for research & development and for small and medium-scale production.
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