The ENVIRO-Optima resist strip system provides the highest throughput per m2 of clean-room space at the lowest cost.
Luminous NA series ashing systems can be used for all sizes of wafers and is compatible with a wide range of processes from critical processes for next generation wafers to wafer level packaging processes.
The SME series deposition system is capable of handling up to 200mm substrate size and is available in several configurations from single to six process chambers.
The SRH PVD system is designed specifically to handle thin wafers and deposit films for UBM and other applications.
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