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CC Series

The CC-200/400 is a compact and easy to use CVD system designed for R&D and Production environments.

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CC Series

The CC-200/400 is a compact and easy to use CVD system designed for R&D and Production environments.

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CC Series

The CC-200/400 is a compact and easy to use CVD system designed for R&D and Production environments.

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CC Series

The CC-200/400 is a compact and easy to use CVD system designed for R&D and Production environments.

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NE-5700

Dry etching system for high volume production with good cost performance and wide selection of tool configuration.

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NE-5700

Dry etching system for high volume production with good cost performance and wide selection of tool configuration.

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NE-5700

Dry etching system for high volume production with good cost performance and wide selection of tool configuration.

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NE-5700

Dry etching system for high volume production with good cost performance and wide selection of tool configuration.

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NE-5700

Dry etching system for high volume production with good cost performance and wide selection of tool configuration.

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RISE Series

Batch-Type chemical cleaning system used for the removal of native oxide in narrow and deep-contact patterns found in advanced semiconductor devices.

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RISE Series

Batch-Type chemical cleaning system used for the removal of native oxide in narrow and deep-contact patterns found in advanced semiconductor devices.

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RISE Series

Batch-Type chemical cleaning system used for the removal of native oxide in narrow and deep-contact patterns found in advanced semiconductor devices.

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ENVIRO-Optima

The ENVIRO-Optima resist strip system provides the highest throughput per m² of clean-room space at the lowest cost.

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ENVIRO-Optima

The ENVIRO-Optima resist strip system provides the highest throughput per m² of clean-room space at the lowest cost.

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ENVIRO-Optima

The ENVIRO-Optima resist strip system provides the highest throughput per m² of clean-room space at the lowest cost.

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ENVIRO-Optima

The ENVIRO-Optima resist strip system provides the highest throughput per m² of clean-room space at the lowest cost.

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ENVIRO-Optima

The ENVIRO-Optima resist strip system provides the highest throughput per m² of clean-room space at the lowest cost.

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SME Series

The SME series deposition system is capable of handling up to 200mm substrate size and is available in several configurations from single to six process chambers.

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SME Series

The SME series deposition system is capable of handling up to 200mm substrate size and is available in several configurations from single to six process chambers.

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SME Series

The SME series deposition system is capable of handling up to 200mm substrate size and is available in several configurations from single to six process chambers.

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SME Series

The SME series deposition system is capable of handling up to 200mm substrate size and is available in several configurations from single to six process chambers.

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SME Series

The SME series deposition system is capable of handling up to 200mm substrate size and is available in several configurations from single to six process chambers.

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SME Series

The SME series deposition system is capable of handling up to 200mm substrate size and is available in several configurations from single to six process chambers.

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SME Series

The SME series deposition system is capable of handling up to 200mm substrate size and is available in several configurations from single to six process chambers.

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CS-200

The CS-200 is a compact load-lock type sputtering system. suitable for research & development and for small and medium-scale production.

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CS-200

The CS-200 is a compact load-lock type sputtering system. suitable for research & development and for small and medium-scale production.

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CS-200

The CS-200 is a compact load-lock type sputtering system. suitable for research & development and for small and medium-scale production.

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CS-200

The CS-200 is a compact load-lock type sputtering system. suitable for research & development and for small and medium-scale production.

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CS-200

The CS-200 is a compact load-lock type sputtering system. suitable for research & development and for small and medium-scale production.

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CS-200

The CS-200 is a compact load-lock type sputtering system. suitable for research & development and for small and medium-scale production.

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ENTRON-EX

The Entron-EX multi-chamber sputtering system is specifically designed for the 300mm Semiconductor market.

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ENTRON-EX

The Entron-EX multi-chamber sputtering system is specifically designed for the 300mm Semiconductor market.

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ENTRON-EX2

Multi-chamber Sputtering System ENTRONTM-EX2 W300 is latest 300mm PVD platform capable of running the most advanced Semiconductor processes.

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ENTRON-EX2

Multi-chamber Sputtering System ENTRONTM-EX2 W300 is latest 300mm PVD platform capable of running the most advanced Semiconductor processes.

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Non-Volatile Memory

RISE Series
ENVIRO-Optima
ENTRON-EX
ENTRON-EX2

Copper Interconnects

RISE Series
ENVIRO-Optima
ENTRON-EX
ENTRON-EX2

CC Series
NE-5700
RISE Series
ENVIRO-Optima
SME Series
CS-200

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