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ENVIRO-1Xa
Advanced plasma resist strip system specifically designed for non-300mm fabs. Equipped with a versatile platform that can handle the complete line of wafer sizes from 4" to 8"
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ENVIRO-1Xa 2C
Dual Chamber Ashing system capable of running two wafer sizes simultaneously from 100mm to 300mm.
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ENVIRO-Optima
The ENVIRO-Optima resist strip system provides the highest throughput per m2 of clean-room space at the lowest cost.
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