Key Features
- In addition to ICP type chamber, an NLD plasma etching chamber, Ashing chamber or CCP chamber can be installed.
- Thanks to STAR Electrode (ULVAC Patent) and various temperature control functions, good process repeatability and stability can be achieved.
- Low downtime thanks to a simple maintenance structure.
- Full process support from ULVAC Institute for Semiconductor and Electronics Technologies.
Need more information?
At ULVAC, we understand that finding the right product is crucial for optimizing your processes, whether you're scaling up production or maintaining precision in your systems. With our wide range of cutting-edge vacuum technologies and in-depth expertise, we will guide you through selecting the ideal solution tailored to your unique requirements.
Contact ULVAC System Sales & Support For inquiries outside North and South America, please contact ULVAC Corporate