Batch Etching at It's Finest
ULVAC's RISE system offers damage-free etching with a low-temperature process option.
Key Metrics
- Damage-free (remote plasma and low-temperature process)
- High throughput and low CoO
- Processing in batches of fifty wafers
- Superior etching uniformity (5% or less per batch)
- Easy maintenance (no side maintenance access is required)
- Small foot print compared to cluster type equipment
- 50% lower self-aligned contact resistance compared to current wet process
- The smallest foot print
Need more information?
At ULVAC, we understand that finding the right product is crucial for optimizing your processes, whether you're scaling up production or maintaining precision in your systems. With our wide range of cutting-edge vacuum technologies and in-depth expertise, we will guide you through selecting the ideal solution tailored to your unique requirements.
Contact ULVAC System Sales & Support For inquiries outside North and South America, please contact ULVAC Corporate