
ULVAC Featured Systems
SEMICON 2025: ULVAC showcases cutting-edge system solutions for deposition, etching, and surface processing. Our featured products highlight advanced performance, reliability, and scalability, empowering next-generation semiconductor manufacturing with precision and innovation.
Powered by proprietary Neutral Loop Discharge (NLD) plasma tech, this production-grade etcher delivers ultra‑low pressure, high‑density plasma, and low electron temperatures—ideal for quartz, glass, crystal, LN, and LT substrates. With options for cassette, aligner, etching, and ashing chambers, it excels in etching optical devices, microlenses, photonics, and μ‑TAS components.
A modular, multi-chamber PVD platform capable of supporting up to 12 modules—ranging from PVD and pre‑clean to heating and cooling. Available in space-efficient Single or Tandem configurations, it packs advanced data analytics for improved yields, maintenance, and operational flow.
NA‑1500 Dry Etching (Ashing) System
Designed for Fan-Out Panel Level Packaging (FO‑PLP) and large‑area substrates (up to ~500 mm or more), this low-temperature (<140 °C) plasma asher offers high photoresist removal rates (>1.5 µm/min) and exceptional uniformity (±10 %). Ideal for resist stripping, plasma cleaning, surface modification (hydrophobic ↔ hydrophilic), descum, and organic film etching.
uGmni Series (e.g., uGmni‑200)
This modular cluster system integrates deposition and etch processes on a unified transfer core. Featuring customizable core shapes (Square, Hexagon, Heptagon) and common operation panels, uGmni reduces spare parts and streamlines processes. It seamlessly handles sputtering, etching, PZT layer processing, descum/ashing, packaging prep, and insulating film treatment.
Descum & Plasma Systems for Advanced Packaging
ULVAC supports sophisticated packaging needs, like descum and plasma surface treatments, complementing its flagship systems with precise, high-throughput cleaning and treatment stages suited for FO-WLP and panel-level manufacturing workflows.