Key Features
- Flexible module configuration.
- System can run both PVD and CVD/ALD process.
- Many applications including: (NVM, Al & Cu wiring, TI/TiN barrier metal, thick AL and Co/Ni salicide etc.)
- Process capability for not only Si devices but also compound semiconductor.
- 10 process modules maximum.
- Single or Tandem platforms are available.
- High Throughput system with great reliability.
- Highly reliable Rorze EFEM used for atmospheric transfer.
- Equipped with the latest control system that complies with the next generation semiconductor Fab.
- Semi Compliant.
