Features
- Long term stable measurements results
- Closed Ion Source Utilizing a Magnetic Field
- Soft ionization provides less gas dissociation and higher sensitivity
- Decomposition and adsorption due to thermal reactions are minimized in the ionization chamber
- Short distance between the process chamber and ion source allows quick-response of analysis
- Wide pressure range from 10-6 to 13kPa is available. (Choice of orifices)
- No need for PC
- "One Click" function
- Max 120ºC High temperature bakeing.
- Electron bombard degas
- Protection and maintenance of ion source and secondary electron multiplier
- Traceability of analysis tube (patent pending)
- Various Leak Tests are Available (Helium leak test, air leak test, leak up)
- Capable of total pressure measurement (External ionization gauge GI-M2)
- This software is included and compatible with (Windows XP/7)
Applications
- For etching and CVD process
- Monitoring reactive gases during process
- End-point monitoring for etching and cleaning processes
- Residual gas analyzing
- Leak testing
Need more information?
At ULVAC, we understand that finding the right product is crucial for optimizing your processes, whether you're scaling up production or maintaining precision in your systems. With our wide range of cutting-edge vacuum technologies and in-depth expertise, we will guide you through selecting the ideal solution tailored to your unique requirements.
Contact ULVAC Component Sales & Support For inquiries outside North and South America, please contact ULVAC Corporate