Features
- Automated mapping function using automated stage generates a film thickness heat-map
- Measure and provide the film thickness and optical parameter distribution of up to φ300mm substrate automatically with programmable R-θ stage.
- High-speed measurement
- Snapshot measurement is achieved by spectroscopic ellipsometry in conjunction with high-order wave plates accomplishing a measurement time of 20ms per data point.
- Users can easily edit and add material table files to create a custom material database
- Capable of multi-layer film thickness measurement
Applications
- Measure transparent or semi-transparent thin film thicknesses and optical parameters on substrates less than or equal to φ300mm (Oxidation film, nitride film, photo resist film, ITO etc.)
Need more information?
At ULVAC, we understand that finding the right product is crucial for optimizing your processes, whether you're scaling up production or maintaining precision in your systems. With our wide range of cutting-edge vacuum technologies and in-depth expertise, we will guide you through selecting the ideal solution tailored to your unique requirements.
Contact ULVAC Component Sales & Support For inquiries outside North and South America, please contact ULVAC Corporate