Enviro 1xa
Advanced Resist Strip System
- The Enviro-1Xa advanced plasma resist strip system from ULVAC is the latest photo resist removal equipment offering exceptional performance at an incredible price.
- Manufactured In Methuen MA, 01844
APD Series
ARC PLASMA DEPOSITION SYSTEM
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A unique technique to generate metallic ions to form ultra thin films and nanparticles with a simple process.
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It is able to obtain results in film flatness and particle formation unobtainable with other deposition methods.
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