The ENVIRO-Optima resist strip system provides the highest throughput per m2 of clean-room space at the lowest cost.
Batch-Type chemical cleaning system used for the removal of native oxide in narrow and deep-contact patterns found in advanced semiconductor devices.
The Entron-EX multi-chamber sputtering system is specifically designed for the 300mm Semiconductor market.
Multi-chamber Sputtering System ENTRONTM-EX2 W300 is latest 300mm PVD platform capable of running the most advanced Semiconductor processes.
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