The ENVIRO-Optima resist strip system provides the highest throughput per m2 of clean-room space at the lowest cost.
Dry etching system for high volume production with good cost performance and wide selection of tool configuration.
Batch-Type chemical cleaning system used for the removal of native oxide in narrow and deep-contact patterns found in advanced semiconductor devices.
200mm PVD cluster system.
The SME series deposition system is capable of handling up to 200mm substrate size and is available in several configurations from single to six process chambers.
The Entron-EX multi-chamber sputtering system is specifically designed for the 300mm Semiconductor market.
Multi-chamber Sputtering System ENTRONTM-EX2 W300 is latest 300mm PVD platform capable of running the most advanced Semiconductor processes.
High Density Low Accelearation type Ion Implanter.
The CC-200/400 is a compact and easy to use CVD system designed for R&D and Production environments.