Contact

IMX-3500

  • Share

Uniform Ion Implantation

The IMX - 3500 medium - current ion implanter is an ion implantation device with a maximum energy of 200 kV and a wafer size of 8 inches, which is ideal for research and development at universities and others.

Get More Information

Request Engineering Information Request a Demo 978-686-7550

Key Features:

  • Maximum substrate size - 6"
  • 1.5% uniformity
  • 10-200kv energy
  • 200KeV small footprint medium current implanter

Need More Information?

Contact ULVAC