Key Features:
- Maximum substrate size - 6"
- 1.5% uniformity
- 10-200kv energy
- 200KeV small footprint medium current implanter
The IMX - 3500 medium - current ion implanter is an ion implantation device with a maximum energy of 200 kV and a wafer size of 8 inches, which is ideal for research and development at universities and others.