CVD Systems for Solar Cell Production

CMD Systems

The CMD Series are single-substrate CVD systems for deposition of amorphous silicon, micro-crytalline silicon, silicon oxide and nitride films using SiH4 or TEOS. A high-frequency (27.12 MHz) plasma enables high-quality film to be formed.

Features

• Unit drive systems can operate at higher temperatures than conventional process temperatures, and a new vacuum transfer robot has been developed to enable a stable transfer system.
• Use of a high-frequency (27.12 MHz) power supply creates high-density plasma, for a high deposition rate.
• Individual substrates can easily be managed using parameters such as deposition conditions.
• A heated reaction gas path enables evacuation of all equipment (up to discharging unit) in gas state. Elimination of piping traps reduces by-product adhesion and maintenance time.