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ULVAC Technologies, Inc.
401 Griffin Brook Drive
Methuen, MA 01844
Tel: 978-686-7550
Fax: 978-689-6300 |
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 Spectroscopic Ellipsometry
UNECS - 2000
UNECS-2000 is based on the Spectroscopic ellipsometry by utilizing the high-order retarders. It is the newest spectroscopic ellipsometer, which realized the high-speed and has a compact size. It has an excellent cost performance, which was impossible by the conventional spectroscopic ellipsometer. Its motorized stage can measure the sample up to the size of φ200mm . Users can use it very easily to get high accurate measurement results. It can be used for various applications such as R&D purposes and manufacturing lines etc
Features
- The high-order retarders are utilized to generate the spectrum carrying information about the wavelength-dependent multiple parameters of polarization of light. It requires no mechanical or active components for polarization-control, such as a rotating compensator and electro-optic modulator. Its snapshot method makes the high- speed measurement possible.
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- The sizes of emitter and receiver of sensor unit are very small due to the spectroscopic ellipsometry by utilizing high-order retarders. The built-in light source and controller are mounted into the modern designed compact enclosure.
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- Other than the main measurement unit with a φ200mm motorized stage, a laptop PC with data analysis software is configured as a default. Users can enjoy the excellent cost performance advantage of this new spectroscopic ellipsometer.
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- Customized Material Tables
Users can easily to edit and add material table files by themselves. .
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- Multi-layer Measurement
It’s possible to measure the multi-layer film thickness up to 6 layers.
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Applications
- Measured transparent or semitransparent thin films thickness and optical parameter on the substrates equal to or less than φ200mm (Oxidation film, nitride film, photo resist film, ITO etc.)
Specifications
| Measurment method |
Spectroscopic ellipsometry |
| Film for measurement *1 |
Transparent film and semitransparent film |
| Light source |
Halogen lamp |
| Spot size |
φ1mm (On substrate： 1[mm] × 3[mm] ) |
| Wavelength |
530 to 750 [nm] |
| Multi-layer film measurement |
Film thickness : Max 6 layer
Film thickness and optical parameter : 1layer (Only the top layer) |
| Angle of incidence |
70º fixed |
| Film thickness Repeatability *2 *3 *4 |
0.1 [nm] |
| Film thickness measurement range *3 |
1[nm] to 2 [μm] |
| Sampling time *3 |
20ms to 3000ms (setting is possible) |
| Analysis time *2 |
300ms |
| Material data file *5 |
Si, SiO2, Si3N4, a-Si, BK7
Ta, Cu, Au, Ni, W, etc. |
| Sample stage size |
φ210 [mm] |
| Maximum sample size |
φ200 [mm] |
| Stage |
R |
0 to 100 [mm] Motor-driven |
| θ |
0 to 359 [ º ] Motor-driven |
| Z |
0 to 10 [mm] manual |
| Control PC |
Laptop PC |
| Dimentions |
500(Ｗ)×512(Ｄ)×428(Ｈ) [mm]
19.7" x 20.2" x 16.9"
PC is excluded |
| Weight |
40 (kg)/88 (lbs)
PC is excluded |
| *1 |
The thickness measurement range for semitransparent films is different than that of transparent films. |
| *2 |
When only the film thickness value is assumed to be a fitting parameter, and the SiO2 film (about 100 nm) on the Si substrate is measured. |
| *3 |
When SiO2 single-layer film on Si wafer is measured. |
| *4 |
Standard deviation (1σ) when measuring it continuousness ten times. |
| *5 |
Material files can be added by the user. |
Click
here to download the PDF file.
For
more information |
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TEL
: 978-686-7550/ FAX : 978-689-6300 |
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