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ULVAC Technologies, Inc.
401 Griffin Brook Drive
Methuen, MA 01844
Tel: 978-686-7550
Fax: 978-689-6300 |
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 Spectroscopic Ellipsometry
UNECS - 3000
UNECS-3000A is high-speed spectroscopic ellipsometer that is quickly appreciable for thickness and optical parameter distribution of thin film by snap shot measurement and automated mapping function. Users can use it very easily to get high accurate measurement results. It can be used for various applications such as R&D purposes and manufacturing lines etc.
Features
- Automated mapping function
Measure and provide the film thickness and optical parameter distribution of a φ300mm substrate automatically with programmable R-θ stage. Moreover, the result of a measurement can be displayed in the color map.
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- High-speed Measurement
The snapshot measurement is realized by the spectroscopic ellipsometry with the high-order retarders, It makes the high-speed measurement of 20ms possible.
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- Excellent Cost-performance
Other than the main measurement unit with a φ300mm automated mapping and auto height adjustment functions, a laptop PC with data analysis software is configured as a default. Users can enjoy the excellent cost performance.
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- Customized Material Tables
Users can easily to edit and add material table files by themselves.
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- Multi-layer Measurement
It’s possible to measure the multi-layer film thickness up to 6 layers.
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Applications
- Measured transparent or semitransparent thin films thickness and optical parameter on the substrates equal to or less than φ300mm (Oxidation film, nitride film, photo resist film, ITO etc.)
Specifications
| Measurment method |
Spectroscopic ellipsometry |
| Film for measurement *1 |
Transparent film and semitransparent film |
| Light source |
Halogen lamp |
| Spot size |
φ1mm (On substrate: 1mm × 3mm) |
| Wavelength |
530nm to 750nm |
| Multi-layer film measurement |
Film thickness : Max 6 layer
Film thickness and optical parameter : 1layer (Only the top layer) |
| Angle of incidence |
70º fix |
| Film thickness repeatability*2 *3 *4 |
0.1nm |
| Film thickness measurement range *3 |
1nm to 2μm |
| Sampling time *3 |
20ms to 3000ms (setting is possible) |
| Analysis time *2 |
300ms |
| Material data file *5 |
Si, SiO2, Si3N4, a-Si, BK7
Ta, Cu, Au, Ni, W, etc. |
| Sample stage size |
φ310mm |
| Maximum sample size |
φ300mm |
| Maximum sample thickness |
30mm |
| Maximum sample weight |
10 (kg)
22 (lbs)
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| Multi site measurement |
Max 200 site |
| Stage |
R |
0 to 150.mm Programmable Resorution: 0.1mm |
| θ |
0 to 359.9º Programmable Resorution: 0.1º |
| Z |
0 to 30mm Auto adjustment |
| Control PC |
Laptop PC |
| Dimentions W×D×H |
Main unit: 450mm×620mm×370mm
17.2" x 24.4" x 14.6"
Control unit: 204mm×500mm×509mm
8" x 19.7" x 20"
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| Weight |
Main unit: 31kg/63 lb
Controll unit: 19Kg/42 lb |
| Power |
AC100Ｖ/200Ｖ Max 3A，50/60Hz |
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*1 |
The semitransparent film is the upper bound in the measurement film thickness. |
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*2 |
When only the film thickness value is assumed to be a fitting parameter, and the SiO2 film (about 100 nm) on the Si substrate is measured. |
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*3 |
When SiO2 single-layer film on Si wafer is measured. |
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*4 |
Standard deviation (1σ) when measuring it continuousness ten times. |
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*5 |
Material can be added by the user. |
Click
here to download the PDF file.
For
more information |
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TEL
: 978-686-7550/ FAX : 978-689-6300 |
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