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ULVAC Technologies, Inc.
401 Griffin Brook Drive
Methuen, MA 01844
Tel: 978-686-7550
Fax: 978-689-6300 |
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Resist Strip
Enviro™
II Platform
Production proven resist strip
and residue clean solutions.
High Does Implant
- "Popping-free" HDI resist strip
process in production since 1995
Post-Oxide Via Etch
- Solvent-free via deveil process in production
since 1998.
Post-Low k Etch
- Low-k (OSG) via resist strip process in production
since 2000.
Enviro™ II System Features
- Microwave & RIE in same reactor
- High throughput dual reactor processing
- Vacuum isolated (load locked) reactor
- Closed loop wafer temperature control
- Precise optical emission end-point control
- Flexible process chemistry with 6 MFCs
- Toxic, corrosive gas compatible gas box design
- Windows XP™ based graphical user interface
- Independent processing mode in each reactor
Cost Savings from Solvent-Free
Enviro™ Via Process at Motorola

For
more information |
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TEL
: 978-686-7550/ FAX : 978-689-6300 |
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