Enviro 1Xa Advanced Plasma Strip 

The Enviro-1Xa advanced plasma resist strip system from ULVAC is the latest photoresist removal equipment offering exceptional performance at an incredible price. Specifically designed for non-300mm fabs, it is equipped with a versatile platform that can handle the complete line of wafer size ranging from 4 inch to 8 inch. The system is capable of high speed photoresist removal at more than 10μm/min, with excellent repeatability and high reliability. The Enviro-1Xa has integrated all the demands from device manufacturers – compact design, high throughput, low cost, less consumable – to deliver the lowest Cost of Ownership (CoO).

Features

• Choice of plasma sources (downstream, WCP or RIE)
• >10 μm/min ashrate (downstream plasma source)
• Excellent uniformity and repeatability
• High throughput
• Auto endpoint detection
• Dual cassette loading
• Compact footprint
• Graphic user interface and touch screen operation
• EU-RoHS compliant
  

Application

• Resist strip for LED and Power Devices Manufacturing
• Post High Dose Implant Resist Removal
• Bulk Resist Strip
• Descum