Systems

ARC PLASMA DEPOSITION ULVAC

A new deposition system using pulsed vacuum arc plasma discharge

ARC PLASMA COATING SERVICES

Arc Plasma Deposition (APD) is a unique form of physical vapor deposition which can be used to deposit uniformly sized nanoparticles (2 nm to 9 nm dia) of platinum and other conductive metals onto micron-size powder substrates. This capability makes this system useful for fuel cell, battery and catalyst research. Deposition of magnetic materials, alloys, DLC and dense metal films, all without the use of any process gas is possible with the APD system. Extremely smooth and dense multilayer thin films can also be produced at rates of ~0.01 to 0.3 nm/sec. Film uniformity is +/- 10% over a 50 mm dia. coated area. This equipment can be scaled up to meet the needs of large batch production requirements.

 

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