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ULVAC Technologies, Inc.
401 Griffin Brook Drive
Methuen, MA 01844
Tel: 978-686-7550
Fax: 978-689-6300 |
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 Etching
Non-volatile Material
ULHITE NE-7800H is a high-temperature
etching system for non-volatile materials (difficult-to-etch
materials) such as FeRAM-MRAM devices. Multi-chamber configuration
is adapted and supports applications ranging from R&D to mass-production.
Features
- Equip with high-temperature (up to 450ºC)
substrate electrode.
- Mechanism for reducing deposition of dielectric
film on RF input window
- High etching rate
- Outstanding metal etching process stability
for Pt/Ir/magnetic films
- Equip with simple ISM™ (Inductively Super
Magnetron) high-density plasma source.
Applications
- FeRAM R&D and mass-production
- MRAM R&D and mass-production
- Non-volatile material etching R&D and
mass-production
Specifications
| Item |
Specification |
| System configuration |
Cassette chamber/auto-loader |
| Transfer chamber |
| Etching chamber |
| Preheating chamber
(option) |
| Ashing chamber
(option) |
| Supported substrate sizes |
6/8 inches |
| Film types |
Ferroelectric/high-k
materials, magnetic materials, electrode materials, other
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| Uniformity within substrate surface |
±5% max. |
| Plasma source |
ISM (ICP with magnetic
field) |
| Substarate electrode temperature |
Up to 400ºC±5ºC |
| Anti-deposition measures |
Faraday shield
mechanism, Top plate heating mechanism, Deposition shield
heating mechanism, other |
| Process recipe editing |
Multi-step type |
For
more information |
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TEL
: 978-686-7550/ FAX : 978-689-6300 |
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