| EtchingSystems |
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NLD-6000 provides superior
solutions for processes from mask deposition through mask
material etching and quartz etching. |
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The CE-300I High-Density Plasma
Etching System for R&D
is a multipurpose high-density plasma etching system, especially
for test facilities such as universities and government agencies. |
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The Hi-Si is a high-speed silicon etching system. Models available
range from prototypes for R&D to multi-chamber systems for mass-production. |
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The ULHITE NE-7800H is a high-temperature
etching system for non-volatile materials (difficult-to-etch
materials) such as FeRAM-MRAM devices. |
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| Sputter Systems |
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The SME Series is a series
of space-saving, low-cost cluster-type sputtering systems
ideal for SAW devices and compound semiconductors. |
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The CME200 is a CVD system for silicon oxide
films and nitride films using SiH4 and TEOS. |
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| Compound Organic/Inorganic
Deposition Systems |
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The VEP Series are systems
optimized for the deposition of various organic and inorganic materials
by either evaporation, sputtering, plasma metallization
and evaporation metallization. |
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