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ULVAC Technologies, Inc.
401 Griffin Brook Drive
Methuen, MA 01844
Tel: 978-686-7550
Fax: 978-689-6300 |
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 Etching
RD Equipment
CE-300I High-Density Plasma
Etching System for R&D CE-300I:ISM (Inductively Super Magnetron)
is a multipurpose high-density plasma etching system, especially
for test facilities such as universities and government agencies.
Features
- Equip with low-pressure, low-electron-temperature and high-density plasma source.
- Supports wide range of process control from ion etching to radical etching.
- Plasma density and uniformity can be controlled by optimizing magnetic field.
- Simple configuration makes maintenance easy.
Applications
- Ultra-high frequency devices, optical devices (LEDs, LDs)
- Next-generation non-volatile memory
- Biochips and microfluid devices
- Photonic crystals
- Sensors, MEMS (micro-electromechanical systems)
Specifications
| Item |
Specification |
| System configuration |
R&D/prototype
system with Load Lock function |
| Substrate size |
Up to 150 mm |
| Operating pressure (Pa) |
0.07 to 6.7 |
| Uniformity within substrate/substrate to
substrate surfaces |
±3% max. |
| Substrate temperature control |
Electrostatic chuck |
For
more information |
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TEL
: 978-686-7550/ FAX : 978-689-6300 |
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