Sputtering Targets for LCD

In recent years the size of sputtering equipment has increased along with the increasing sizes of mother glass. ULVAC provides high performance sputtering targets for these large sizes. In particular, ITO target, transparent dielectric material, with low particle and ultra-high density has been developed and provides high productivity.

Features

Development of Ultra-high density ITO target for transparent dielectric layer (density of 99.5% or greater is guaranteed)
Fine crystal particle, splash-free, large Al target
Large, monolithic Mo target
Development of high purity (4N or greater), large, monolithic Cr target

Applications

Transparent dielectric layer for TFT and color filter
Electrode for TFT
Wiring for TFT
Blackmatrix material
Barrier metal for TFT

Resistance stability of ultra-high density ITO target

Impurity for ITO Target

Impurity Element	Fe	Cu	Pb	Al	Ni	SnO² structure rating
Allowable Level	£30 ppm	£20 ppm	£20 ppm	£10 ppm	£10 ppm	10±0.5wt%

For Electronic Parts	Ni NiCr Al AlTi TiB	Resistance films Resistance films Wiring Reflection films
For Magnetic Heads/ Memory Media	Ta NiMn FeNi PtMn Al₂O₃ AlTi CoCrPt CoCrPtB Si C GeAsTe Bi AgInAsTe	For Head For MO For HD Memory DVD CD-RW
Mask Materials	MoSix Cr TaB TaGe	Phase Shift Mask For X-ray Exposure
Reflection-increase Anti-reflection Film Coating on Glass/Resin	Si SiO₂ Ti (TiO₂) Al (Al₂O₃) SUS Ta Ag	AR Coat Cylindrical SHaped, Large, Monolithic Products, etc are available
Materials for Solar Batteries	ZnO ITO ZnO-Al₂O₃ Al Si	Thin Film Materials for Solar Batteries

For more information

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TEL : 978-686-7550/ FAX : 978-689-6300