Thin Film Deposition

ULVAC SME-200 SPUTTERING SYSTEM

World`s first, Low temperature PZT sputtering technology in mass production scale developed for piezoelectric MEMS device integrated on CMOS

ULVAC announces world’s first, low temperature PZT sputtering technology

Features

  • SME-200E is cluster type Sputtering system for research and development and production purpose.
  • Substrate size up to φ200mm.
  • Superior Cycle Performance
  • Excellent Breakdown Voltage
  • Low temperature process <500 C
  • Process chamber up to seven process chambers can be equipped.
  • Available for various application-specific process modules.
  • Substrate heating mechanism, simultaneous deposition and revolved deposition are available.

Applications

  • R&D.
  • Production.