Magest S200 for Magnetic Films
MagestTM S200 provides the multi-layer deposition of ultra thin films under the ultra high vacuum condition and is applicable for the deposition of various materials by RF or DC sputtering.
- UHV (ultra-high vacuum) processes.
- Triple-gun cathode.
- Outstanding controllability and reproducibility with ultra-thin films of 10 nm or less
- Excellent control of magnetic anisotropy and coercive force
- MRAM and Magnetic Device
- Materials development