| |
CMD-450BHT |
CMD-650HT |
CMD-950 |
| Substrate size (mm) |
400X 500 Xt0.7 |
600 X 720 Xt0.7 |
730X920Xt0.7`0.5 |
| Chamber configuration |
1) Loading/ unloading chambers |
2
|
2
|
2
|
| 2) Heating chambers |
1
|
1
|
1
|
| 3) Reaction chambers |
4
(3 if annealing chamber is mounted)
|
4
(3 if annealing chamber is mounted)
|
5
(4 if annealing chamber is mounted)
|
| 4) Transfer chambers |
1 (7-sided)
|
1 (7-sided)
|
1 (8-sided)
|
5) Evacuation system
Loading/
unloading chamber
Reaction chambers |
Rotary + mechanical boom
Dry + mechanical boom
|
Rotary + mechanical boom
Dry + mechanical boom
|
Rotary + mechanical boom
Dry + mechanical boom
|
| 6) Substrate transfer unit |
Option
|
Option
|
Option
|
| Productivity |
65 seconds/substrate
(for single-layer 300 nm SiN film under standard Ulvac
conditions)
|
65 seconds/substrate
(for single-layer 300 nm SiN film under standard Ulvac
conditions)
|
75 seconds/substrate
(for single-layer 300 nm SiN film under standard Ulvac
conditions
|