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ULVAC Technologies, Inc.
401 Griffin Brook Drive
Methuen, MA 01844
Tel: 978-686-7550
Fax: 978-689-6300 |
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Sputtering Systems
 SH
and SIH Series Sputtering Systems
Parallel-beam batch type and
load-lock type sputter systems. Series models include batch
types, simple load-lock types with a linear input mechanism,
and tray-transfer load-lock types.
Features
- Wide range of options enables use in many
applications, ranging from R&D to small-scale production.
- Substrate electrode diameters of between 100
to 550 mm can be selected to meet desired scale.
- Target diameters range from 80 to 200 mm for
each model. Targets for non-magnetic or magnetic substances
Applications
- Deposition of electrode films, insulating
films or dielectric films on various substrates
Specifications
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SH-S100
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SH-250
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SH-350E
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| Standard evacuation system |
4-inch diffusion pump
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6-inch cryopump
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6-inch cryopump
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| Final pressure |
1e-4Pa
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6.7e-5Pa
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6.7e-5Pa
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| Deposition direction |
Up
|
Up
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Up
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Deposition area uniformity
Static
Rotary |
µ50mm ± 10%
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µ40/µ50mm ± 10%
ID90xOD170mm ± 5%
/ID80xOD180mm ± 5%
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f50mm ± 10%
ID150xOD250mm ± 5%
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Substrate heating
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300°C
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300°C
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300°C
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Control system
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Manual
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Evacuation: Automatic; Deposition:
Manual
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Automatic
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SH-350/SH-350N
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SH-450
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SH-550
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| Standard evacuation system |
8-inch cryopump
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10-inch cryopump
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12-inch cryopump
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| Final pressure |
6.7e-5Pa
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6.7e-5Pa
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6.7e-5Pa
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| Deposition direction |
Up
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Up
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Up
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Deposition area uniformity
Static
Rotary |
µ50mm ± 10%
ID150xOD250mm ± 5%
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µ75mm ± 10%
ID255xOD405mm ± 5%
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µ100mm ± 10%
ID270xOD470mm ± 5%
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Substrate heating
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300°C
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300°C
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300°C
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Control system
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Automatic
(touch-panel)
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Automatic
(touch-panel)
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Automatic
(touch-panel)
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SIH-350
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SIH-450
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SIH-550
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| Standard evacuation system |
8-inch cryopump
|
10-inch cryopump
|
10-inch cryopump
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| Final pressure |
6.7e-5Pa
|
6.7e-5Pa
|
6.7e-5Pa
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| Deposition direction |
Up
|
Up
|
Up
|
Deposition area uniformity
Static
Rotary |
µ50mm ± 10%
ID150xOD250mm ± 5%
|
µ75mm ± 10%
ID255xOD405mm ± 5%
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µ100mm ± 10%
ID270xOD470mm ± 5%
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Substrate heating
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300°C
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300°C
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300°C
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Control system
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Automatic
(touch-panel)
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Automatic
(touch-panel)
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Automatic
(touch-panel)
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| Options |
Turbo pump
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High-temperature heating
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Oil diffusion pump
(except SH-350N)
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Drainage cold electrode
Simultaneous multi-source deposition High-speed rotary
electrode
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Simultaneous multi-source deposition
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High-speed rotary electrode
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Down deposition
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APC mechanism
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Conventional cathode
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Reactive sputter
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Cathode for strong magnets
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Simple load-lock mechanism
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RF etch cleaning
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Bias mechanism
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For
more information |
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TEL
: 978-686-7550/ FAX : 978-689-6300 |
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